@Article{CamposCoTrMoBaCo:2012:CVDiFi,
               author = "Campos, Raonei Alves and Contin, Andre and Trava-Airoldi, Vladimir 
                         J. and Moro, J. R. and Barquete, D. M. and Corat, Evaldo J.",
          affiliation = "{Instituto Nacional de Pesquisas Espaciais (INPE)} and {Instituto 
                         Nacional de Pesquisas Espaciais (INPE)} and {Instituto Nacional de 
                         Pesquisas Espaciais (INPE)} and IFSP, Instituto Federal de 
                         Educa{\c{c}}{\~a}o, Ci{\^e}ncia e Tecnologia de S{\~a}o Paulo, 
                         CEP 12929-600 Bragan{\c{c}}a Paulista, SP, Brazil and UESC, 
                         Universidade Estadual de Santa Cruz, Rodovia Ilh{\'e}us-Itabuna, 
                         CEP 45662-900, Ilh{\'e}us, BA, Brazil and {Instituto Nacional de 
                         Pesquisas Espaciais (INPE)}",
                title = "CVD Diamond Films Growth on Silicon Nitride Inserts 
                         (Si<sub>3</sub>N<sub>4</sub>) with High Nucleation Density by 
                         Functionalization Seeding",
              journal = "Materials Science Forum. Advanced Powder Technology VIII Book 
                         Series",
                 year = "2012",
               volume = "727-728",
                pages = "1433--1438",
             keywords = "CVD diamond, HFCVD, Silicon nitride (Si 3N 4).",
             abstract = "Silicon Nitride is largely used as the base material to 
                         manufacture cutting tools. Due to its low thermal expansion 
                         coefficient it is ideal candidate for CVD diamond deposition. In 
                         this work, we functionalized the surface of silicon nitride 
                         inserts (Si 3N 4) with a polymer (PDDA - Poly 
                         (diallyldimethylamonium chloride - Mw 40000)) to promote seeding 
                         with nanodiamond particles. The seeding was performed in water 
                         slurry containing 4 nm diamond particles dispersed by PSS - Poly 
                         (sodium4-styrenesulfonate) polymer. CVD diamond films, with high 
                         nucleation density, were deposited in a hot filament reactor. Film 
                         morphology was characterized by Atomic Force Microscopy (AFM) and 
                         Scanning Electron Microscopy (SEM). Diamond film quality was 
                         determined by Raman Spectroscopy. CVD diamond film adherence was 
                         evaluated using Rockwell C indentation.",
                  doi = "10.4028/www.scientific.net/MSF.727-728.1433",
                  url = "http://dx.doi.org/10.4028/www.scientific.net/MSF.727-728.1433",
                 issn = "0255-5476",
                label = "lattes: 5450987692265022 2 CamposCoTrMoBaCo:2012:CVDiFi",
             language = "pt",
        urlaccessdate = "30 abr. 2024"
}